Suggested approach: Start at the top and work your way down to the bottom. If you do some work every day, you should not need to worry about due dates. However, you should be aware of the due dates, just to be certain that you don't miss anything.
Intro
- Intro
- Safety
- Our CyMOS process
- "Modern" CMOS
Oxidation
- Silicon dioxide properties
- Thermal oxidation
- Example calculations
- Oxidation systems
- Oxide measurement
- Oxide - miscellaneous details
Lithography
- Overview
- Systems
- Optics
- Photoresists
- Advanced methods
Doping
- Review: acceptors and donors
- Review: resistivity/conductivity
- Diffusion
- Example calculations
- Diffusion systems
- Diffusion - miscellaneous details
- Measuring doping
- Ion implantation
- Example calculations
Thin films
- Overview
- Review of ideal gases
- Plasmas
- Evaporation
- Sputtering
- Chemical vapor deposition
- Plasma etching
Contacts and interconnects
- Ohmic contacts
- TLM measurements
- Interconnects
- Chemical-mechanical polishing
- Copper
A suggested work schedule - Jan 25 to May 6. If you follow this and work on each items within few days of its listed date, you should be fine. However, you should be aware of the official due dates just to make certain that you don't miss anything.
date | day | read / practice | quiz | homework | Lab |
---|---|---|---|---|---|
1/25 | Mon | Course intro Lab safety |
No lab | ||
1/26 | Tue | ||||
1/27 | Wed | the CyMOS process | |||
1/28 | Thu | ||||
1/29 | Fri | Silicon dioxide | |||
1/30 | Sat | ||||
2/1 | Mon | Oxide growth | Lab 1 - Field oxide | ||
2/2 | Tue | ||||
2/3 | Wed | Oxidation examples | |||
2/4 | Thu | ||||
2/5 | Fri | Litho & etching - overview | |||
2/6 | Sat | ||||
2/8 | Mon | Oxide measurements, etc. | 1 - oxidation | HW set 1 | Lab 2 - PWELL litho |
2/9 | Tue | ||||
2/10 | Wed | Diffusion | 2 - oxidation | ||
2/11 | Thu | ||||
2/12 | Fri | ||||
2/13 | Sat | ||||
2/15 | Mon | Diffusion examples | 3 - oxidation | Lab 3 - PWELL boron deposition | |
2/16 | Tue | ||||
2/17 | Wed | Diffusion systems | 4 - oxidation | ||
2/18 | Thu | ||||
2/19 | Fri | Resistance measurements | |||
2/20 | Sat | ||||
2/22 | Mon | SRD & SIMS | 5 - CyMOS | HW set 2 | Lab 4 - PMOS litho |
2/23 | Tue | ||||
2/24 | Wed | Modern CMOS | 6 - diffusion | ||
2/25 | Thu | ||||
2/26 | Fri | ||||
2/27 | Sat | ||||
3/1 | Mon | Ion implantation | 7 - diffusion | Lab 5 - PMOS drive | |
3/2 | Tue | ||||
3/3 | Wed | 8 - diffusion | |||
3/4 | Thu | ||||
3/5 | Fri | Implant example calculations | |||
3/6 | Sat | ||||
3/8 | Mon | Thin films - intro | 9 - diffusion | HW set 3 | Lab 6 - NMOS litho |
3/9 | Tue | ||||
3/10 | Wed | Ideal gases - review | 10 - resistance | ||
3/11 | Thu | ||||
3/12 | Fri | Vacuum | |||
3/13 | Sat | ||||
3/15 | Mon | Exam 1 | Lab 7 - NMOS diffusion | ||
3/16 | Tue | ||||
3/17 | Wed | Plasmas | 11 - resistance | ||
3/18 | Thu | ||||
3/19 | Fri | Evaporation | |||
3/20 | Sat | ||||
3/22 | Mon | Sputtering | 12 - van der Pauw | HW set 4 | Lab 8 - Gate oxidation |
3/23 | Tue | ||||
3/24 | Wed | CVD | |||
3/25 | Thu | ||||
3/26 | Fri | ||||
3/27 | Sat | ||||
3/29 | Mon | Plasma etching | 13 - ion implant | Lab 9 - Contact via lithography / metallization | |
3/30 | Tue | ||||
3/31 | Wed | 14 - ion implant | |||
4/1 | Thu | ||||
4/2 | Fri | Ohmic contacts | |||
4/3 | Sat | ||||
4/5 | Mon | Ohmic contacts | 15 - ion implant | HW set 5 | Lab 10 - Contact lithography |
4/6 | Tue | ||||
4/7 | Wed | TLM measurements | |||
4/8 | Thu | ||||
4/9 | Fri | Interconnects | |||
4/10 | Sat | ||||
4/12 | Mon | Interconnects | 16 - TLM | Lab 11A - Device testing | |
4/13 | Tue | ||||
4/14 | Wed | 17 - TLM | |||
4/15 | Thu | ||||
4/16 | Fri | ||||
4/17 | Sat | ||||
4/19 | Mon | HW set 6 | Lab 11B - Device testing | ||
4/20 | Tue | ||||
4/21 | Wed | ||||
4/22 | Thu | ||||
4/23 | Fri | ||||
4/24 | Sat | ||||
4/26 | Mon | ||||
4/27 | Tue | ||||
4/28 | Wed | ||||
4/29 | |||||
4/30 | Fri | ||||
5/1 | Sat | ||||
5/3 | Mon | Exam 2 | |||
5/4 | Tue | Exam 2 | |||
5/5 | Wed | Exam 2 | |||
5/6 | Thu | Exam 2 |
Due dates for all EE 432/532 work.
Do not use this list as means for managing your time. Use it in conjunction with the "subject" or "day-by-day" lists to make certain that you are not late for any work.
work | due date 1 | due date 2 |
---|---|---|
Quiz 1 | Sat, Mar 6 | Sat, Mar 13 |
Quiz 2 | Sat, Mar 6 | Sat, Mar 13 |
Quiz 3 | Sat, Mar 6 | Sat, Mar 13 |
Quiz 4 | Sat, Mar 6 | Sat, Mar 13 |
Quiz 5 | Sat, Mar 6 | Sat, Mar 13 |
HW 1 | Sat, Mar 6 | Sat, Mar 13 |
PWELL lab report | Sat, Mar 6 | Sat, Mar 13 |
Exam 1 | Tue, Mar 16 | N/A |
Quiz 6 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 7 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 8 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 9 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 10 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 11 | Sat, Mar 20 | Sat, Mar 27 |
Quiz 12 | Sat, Mar 20 | Sat, Mar 27 |
HW 2 | Sat, Mar 20 | Sat, Mar 27 |
HW 3 | Sat, Mar 20 | Sat, Mar 27 |
PMOS lab report | Sat, Mar 20 | Sat, Mar 27 |
Quiz 13 | Sat, Apr 3 | Sat, Apr 10 |
Quiz 14 | Sat, Apr 3 | Sat, Apr 10 |
Quiz 15 | Sat, Apr 3 | Sat, Apr 10 |
HW 4 | Sat, Apr 3 | Sat, Apr 10 |
NMOS lab report | Sat, Apr 3 | Sat, Apr 10 |
Quiz 16 | Sat, Apr 24 | Sat, May 1 |
Quiz 17 | Sat, Apr 24 | Sat, May 1 |
HW 5 | Sat, Apr 24 | Sat, May 1 |
Gate & Contacts lab report | Sat, Apr 24 | Sat, May 1 |
HW 6 | Thu, May 6 | Thu, May 13 |
Final lab report | Thu, May 6 | Thu, May 13 |
Exam 2 | Thu, May 6 | NA |